Applied logistic regression.

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Bibliographic Details
Main Author: Hosmer, David W (autor)
Other Authors: Lemeshow, Stanley (autor), Sturdivant, Rodney X (autor)
Format: Book
Language:English
Published: Hoboken, Estados Unidos: John Wiley and Sons, 2013.
Edition:3a. edición.
Series:Wiley Series in Probability and Statistics.
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